Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-07-03
2009-12-15
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07632612
ABSTRACT:
A halftone phase shift mask blank for use in manufacturing a halftone phase shift mask comprises a transparent substrate, a light transmitting portion formed on the substrate for transmitting an exposure light beam, a phase shifter portion formed on the substrate for transmitting a part of the exposure light beam as a transmitted light beam and for shifting a phase of the transmitted light beam by a predetermined amount, and a phase shifter film for forming the phase shifter portion. The halftone phase shift mask has an optical characteristic such that light beams passing through the light transmitting portion and through the phase shifter portion cancel each other in the vicinity of a boundary portion therebetween, thereby maintaining and improving an excellent contrast at a boundary portion of an exposure pattern to be transferred onto the surface of an object to be exposed. The phase shifter film comprises a film containing silicon, oxygen, and nitrogen as main components and an etching stopper film formed between the film and transparent substrate.
REFERENCES:
patent: 5284724 (1994-02-01), Noelscher et al.
patent: 5679484 (1997-10-01), Ito et al.
patent: 5935735 (1999-08-01), Okubo et al.
patent: 5942356 (1999-08-01), Mitsui et al.
patent: 6451489 (2002-09-01), Kaneko
patent: 6743553 (2004-06-01), Shiota et al.
patent: 6869736 (2005-03-01), Nakagawa et al.
patent: 2001/0005564 (2001-06-01), Motonaga et al.
patent: 2002/0122991 (2002-09-01), Shiota et al.
patent: 101 64 189 (2002-08-01), None
patent: 2-39153 (1990-02-01), None
patent: 4-136854 (1992-05-01), None
patent: 4-140635 (1992-05-01), None
patent: 6-83034 (1994-03-01), None
patent: 7-104457 (1995-04-01), None
patent: 7-168343 (1995-07-01), None
patent: 7-209849 (1995-08-01), None
patent: 8-76353 (1996-03-01), None
patent: 8-325560 (1996-12-01), None
patent: 10-198017 (1998-07-01), None
patent: 2001-56545 (2001-02-01), None
patent: 2001-66756 (2001-03-01), None
patent: 2001-174973 (2001-06-01), None
patent: 2001-337436 (2001-12-01), None
patent: 1998-33168 (1998-07-01), None
patent: 10-190358 (1999-01-01), None
patent: 2001-30448 (2001-04-01), None
patent: WO 2002-21210 (2002-03-01), None
Chinese Office Action dated Jan. 23, 2009.
Mitsui Hideaki
Nozawa Osamu
Ohkubo Ryo
Shiota Yuuki
Hoya Corporation
Rosasco Stephen
Sughrue & Mion, PLLC
LandOfFree
Halftone phase shift mask blank, halftone phase shift mask,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Halftone phase shift mask blank, halftone phase shift mask,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Halftone phase shift mask blank, halftone phase shift mask,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4061281