Halftone phase shift mask blank, halftone phase shift mask,...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07115341

ABSTRACT:
A halftone phase shift mask blank for use in manufacturing a halftone phase shift mask comprises a transparent substrate, a light transmitting portion formed on the substrate for transmitting an exposure light beam, a phase shifter portion formed on the substrate for transmitting a part of the exposure light beam as a transmitted light beam and for shifting a phase of the transmitted light beam by a predetermined amount, and a phase shifter film for forming the phase shifter portion. The halftone phase shift mask has an optical characteristic such that light beams passing through the light transmitting portion and through the phase shifter portion cancel each other in the vicinity of a boundary portion therebetween, thereby maintaining and improving an excellent contrast at a boundary portion of an exposure pattern to be transferred onto the surface of an object to be exposed. The phase shifter film comprises a film containing silicon, oxygen, and nitrogen as main components and an etching stopper film formed between the film and transparent substrate.

REFERENCES:
patent: 6743553 (2004-06-01), Shiota et al.
patent: 6869736 (2005-03-01), Nakagawa et al.
patent: 2002/0122991 (2002-09-01), Shiota et al.
patent: 2-39153 (1990-02-01), None
patent: 4-136854 (1992-05-01), None
patent: 4-140635 (1992-05-01), None
patent: 6-83034 (1994-03-01), None
patent: 7-104457 (1995-04-01), None
patent: 7-168343 (1995-07-01), None
patent: 7-209849 (1995-08-01), None
patent: 8-76353 (1996-03-01), None
patent: 8-325560 (1996-12-01), None
patent: 10-198017 (1998-07-01), None
patent: 2001-56545 (2001-02-01), None
patent: 2001-66756 (2001-03-01), None
patent: 2001-174973 (2001-06-01), None
patent: 2001-337436 (2001-12-01), None
patent: WO-2002-21210 (2002-03-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Halftone phase shift mask blank, halftone phase shift mask,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Halftone phase shift mask blank, halftone phase shift mask,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Halftone phase shift mask blank, halftone phase shift mask,... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3705503

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.