Guard ring electrostatic chuck

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

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H02N 1300

Patent

active

056128517

ABSTRACT:
An electrostatic chuck is disclosed that is resistant to the formation of vacuum arcs between the back of the wafer being processed and the body of the chuck. A guard ring surrounds the chuck and floats close to the self-bias potential induced by the plasma on the wafer. The voltage between the wafer and the closest electrode is thereby capacitively divided by the guard ring.

REFERENCES:
patent: 5400209 (1995-03-01), Moslehi
patent: 5436790 (1995-07-01), Blake et al.
patent: 5444597 (1995-08-01), Blake et al.
patent: 5463525 (1995-10-01), Barnes et al.

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