Growth of single crystal bismuth silicon oxide

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156617SP, 156624, 156DIG79, 423326, 422249, B01J 1718, C01G 2900

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active

041871391

ABSTRACT:
Method of growing single crystal of bismuth silicon oxide from a melt of Bi.sub.x Si O.sub.1.5x+2, in an oxygen containing atmosphere. At the start of crystallization, x has a value of 11.55 to 11.82 or 12.35 to 14.00. The value of x does not have a spread of more than 0.025 throughout the crystal.

REFERENCES:
patent: 3418086 (1968-12-01), Loiacono
patent: 3653814 (1972-04-01), Bonner
patent: 3723599 (1973-03-01), Brandle
patent: 3883313 (1975-05-01), Cullen
Chemical Abstracts, "Rez", vol. 74, #20, 1971, p. 364, Abstract #105,156m.

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