Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
Reexamination Certificate
2011-03-22
2011-03-22
Such, Matthew W (Department: 2891)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
On insulating substrate or layer
C117S101000, C257SE21131, C438S973000
Reexamination Certificate
active
07910462
ABSTRACT:
An assembly and method of making the same wherein the assembly incorporates a rare-earth oxide film to form a [110] crystal lattice orientation semiconductor film. The assembly comprises a substrate, a rare-earth oxide film formed on the substrate, and a [110]-oriented semiconductor film formed on the rare-earth oxide film. The rare-earth oxide film having a [110] crystal lattice orientation. The substrate has a [001] crystal lattice orientation.
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Blakely , Sokoloff, Taylor & Zafman LLP
Intel Corporation
Such Matthew W
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