Groupwise corrected objective

Optical: systems and elements – Miscellaneous

Reexamination Certificate

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C359S650000, C359S900000

Reexamination Certificate

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07576934

ABSTRACT:
An objective and method of fabricating an objective, particularly a projection objective for microlithography, comprising a plurality of optical elements. In one example, the method comprises acts of determining groups of optically similar optical elements or surfaces having at least two members, determining wave front deformations by the optical elements or surfaces, determining the necessary corrections for the optical elements or surfaces of a group, and performing the corrections for a group at a group member.

REFERENCES:
patent: 5696631 (1997-12-01), Hoffman
patent: 6268903 (2001-07-01), Chiba
patent: 6678240 (2004-01-01), Geh et al.
patent: 6934011 (2005-08-01), Geh et al.
patent: 2005/0254042 (2005-11-01), Geh et al.
patent: 10146499 (2006-11-01), None

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