Group III nitride contact structures for light emitting devices

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

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C257S021000, C257S079000, C257S099000, C257S103000

Reexamination Certificate

active

06987281

ABSTRACT:
A superlattice contact structure for light emitting devices includes a plurality of contiguous p-type Group III nitride layers. The contact structure may be formed of p-type indium nitride, aluminum indium nitride, or indium gallium nitride. Also disclosed is a light emitting device that incorporates the disclosed contact structures.

REFERENCES:
patent: 4865685 (1989-09-01), Palmour
patent: 4866005 (1989-09-01), Davis et al.
patent: 4912063 (1990-03-01), Davis et al.
patent: 4912064 (1990-03-01), Kong et al.
patent: 4918497 (1990-04-01), Edmond
patent: 4946547 (1990-08-01), Palmour et al.
patent: 4981551 (1991-01-01), Palmour
patent: 5011549 (1991-04-01), Kong et al.
patent: 5027168 (1991-06-01), Edmond
patent: 5087576 (1992-02-01), Edmond et al.
patent: 5119540 (1992-06-01), Kong et al.
patent: 5338944 (1994-08-01), Edmond et al.
patent: 5753939 (1998-05-01), Sassa et al.
patent: 5812576 (1998-09-01), Bour
patent: 6051849 (2000-04-01), Davis et al.
patent: 6063186 (2000-05-01), Irvine et al.
patent: 6117688 (2000-09-01), Evans, Jr. et al.
patent: 6153010 (2000-11-01), Kiyoku et al.
patent: 6265289 (2001-07-01), Zheleva et al.
patent: 6459100 (2002-10-01), Doverspike et al.
patent: 6479836 (2002-11-01), Suzuki et al.
patent: 6582986 (2003-06-01), Kong et al.
patent: 6608327 (2003-08-01), Davis et al.
patent: 2002/0008243 (2002-01-01), Scott et al.
patent: 2002/0141468 (2002-03-01), Shigetoshi et al
patent: 0 622 858 (1994-11-01), None
patent: WO 03/005459 (2003-01-01), None
Jeon et al.; Lateral current spreading in GaN-based light-emitting diodes utilizing tunnel contact junctions; Applied Physics Letters, vol. 78, No. 21; May 21, 2001; pp. 3265-3267; American Institute of Physics.
Sheu etal.; Low-Operation Voltage of InGaN/GaN Light-Emitting Diodes with Si-Doped In(0.3) Ga(0.7) N/GaN Short-Period Superlattice Tunneling Contact Layer; IEEE Electron Device Letters; vol. 22, No. 10; Oct. 2001.
Sheu J K et al; Low-operation voltage of INGAN/GAN Light-Emitting Diodes by Using a MG-DOPED AIO.15GaO.85N/GANSuperlattice;Apr. 4, 2001; 160-162;V22/10;XP-001099979.
Sheu J K et al; Low-operation voltage of INGAN/GAN Light-Emitting Diodes With SI-DOPED INO.3GAO.7N/GAN Short-Period Superlattic Tunneling Contact Layer; IEEE Electron Device Letters, IEEE Inc.; New York, US; V22/10; 10-10-2001; pp. 460-462; XP001108397.
Myers T H et al.; Magnesium and Beryllium Doping During ri-plasma MBE Growth of GanN; Sep. 24, 2000; Proceedings of International Workshop on Nitride Semiconductors Inst. Pure & Appl. Phys. Tokyo, Japan; pp. 451-454; XP002302522.

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