Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-06-29
1989-10-24
Lesmes, George F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
29603, 20419222, 360110, 360122, 427129, 428472, 4284722, 428694, 428900, G11B 542, C23C 1434
Patent
active
048759872
ABSTRACT:
A grooved magnetic substrate including an alumina film layer having a Knopp hardness of 600 kg/mm.sup.2 to 1200 kg/mm.sup.2 charged in at least one groove formed in a surface of a magnetic substrate. The magnetic substrate may be Mn-Zn or Ni--Zn base ferrite. The alumina film layer is formed by sputtering.
REFERENCES:
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patent: 4588654 (1986-05-01), Kobuke
patent: 4598052 (1986-07-01), Wada et al.
patent: 4608293 (1986-08-01), Wada
patent: 4656547 (1987-04-01), Kumasaka et al.
patent: 4659606 (1987-04-01), Wada et al.
patent: 4690846 (1987-09-01), Wada et al.
Katsuyama Yoshiaki
Nakaoka Junichi
Wada Toshiaki
Lesmes George F.
Monroe James B.
Sumitomo Special Metals Co. Ltd.
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