Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1996-05-17
1997-10-28
Ngo, Ngan V.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257331, 257341, H01L 2976, H01L 2994, H01L 31062, H01L 31113
Patent
active
056820488
ABSTRACT:
A semiconductor structure having a plurality of drivers in and on the same semiconductor substrate is arranged to increase the density of integrated components and reduce the on resistance. The semiconductor structure employs a double layer interconnection structure having source and drain electrodes at two different levels, and an insulated gate electrode in a groove formed the semiconductor substrate. Each drain lead region having a low resistivity material extends from the upper surface of the substrate to a low resistivity buried layer. Each drain opening is surrounded by a source zone formed with a series of source holes or a long and narrow source slot, and this basic pattern is regularly repeated in a plane.
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patent: 5034785 (1991-07-01), Blanchard
patent: 5192989 (1993-03-01), Matsushita et al.
patent: 5283454 (1994-02-01), Cambou
patent: 5352915 (1994-10-01), Hutchings et al.
patent: 5378914 (1995-01-01), Ohzu et al.
Hoshi Masakatsu
Mihara Teruyoshi
Shinohara Toshiro
Ngo Ngan V.
Nissan Motor Co,. Ltd.
Wilson Allan R.
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