Groove cleaning device for chemical-mechanical polishing

Details Groove cleaning device for chemical-mechanical polishing Groove cleaning device for chemical-mechanical polishing

1998-02-11

2000-10-24

Eley, Timothy V.

Abrading

Accessory

Dressing

451444, B24B 2118

Patent

active

061358681

ABSTRACT:
An improved chemical-mechanical polishing method and apparatus is provided. A brush is employed to continually brush slurry particles from surface features, e.g., grooves, on a polishing pad. In this manner slurry is prevented from becoming compacted within the grooves as the slurry passes beneath and is subjected to compressive forces of a wafer polishing head. The invention may be practiced by use of a stationary brush operatively coupled to the polishing pad surface, or by an improved conditioning assembly having both a diamond surface for conditioning the polishing pad and a brush for cleaning the pad's surface features. The brush portion of the conditioning assembly may or may not rotate as it is scanned across the surface of the polishing pad.

REFERENCES:
patent: 5216843 (1993-06-01), Breivogel et al.
patent: 5456627 (1995-10-01), Jackson et al.
patent: 5595527 (1997-01-01), Appel et al.
patent: 5626509 (1997-05-01), Hayashi
patent: 5643067 (1997-07-01), Katsuoka et al.
patent: 5690544 (1997-11-01), Sakurai
patent: 5775983 (1998-07-01), Shendon et al.
patent: 5782675 (1998-07-01), Southwick
patent: 5785585 (1998-07-01), Manfredi et al.
patent: 5857899 (1999-01-01), Volodarsky et al.
patent: 5902173 (1999-05-01), Tanaka
patent: 5906754 (1999-05-01), Appel et al.
patent: 5954570 (1999-09-01), Yano et al.

Affiliated with

Also associated with

Rating

Groove cleaning device for chemical-mechanical polishing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Groove cleaning device for chemical-mechanical polishing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Groove cleaning device for chemical-mechanical polishing will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1958671