Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-04-25
2006-04-25
Kackar, Ram N (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S724000, C118S728000, C118S500000, C118S715000, C156S345510, C156S345520, C156S345530, C219S444100, C219S544000, C392S416000, C392S418000, C204S192100, C204S298010, C279S128000, C279S003000, C361S234000
Reexamination Certificate
active
07033445
ABSTRACT:
Susceptor designs are provided for controlling damage to wafers, particularly during cold wafer drops-off on a hot susceptor. The designs include axisymmetric grid designs, such that thermal gradients are symmetrical in the circumferential (θ) direction and the same traversing any particular radial line. The grids are preferably arcuate and each have the same surface area. In one embodiment an outer zone is asymmetrically designed to induce predictable wafer curling in a saddle shape.
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Keeton Tony J.
Lutz Zachary L.
ASM America Inc.
Kackar Ram N
Knobbe Martens Olson & Bear
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