Graphoepitaxy using energy beams

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156612, 15662071, 15662072, 156DIG64, 156DIG73:DIG.80, 156DIG88, 148DIG3, 148DIG90, 148DIG131, 437977, C30B 1332, C30B 2906, C30B 3300, C30B 1912

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active

051222230

ABSTRACT:
Improvements to graphoepitaxy include use of irradiation by electrons, ions or electromagnetic or acoustic radiation to induce or enhance the influence of artificial defects on crystallographic orientation; use of single defects; and use of a relief structure that includes facets at 70.5 and/or 109.5 degrees.

REFERENCES:
patent: 3341361 (1967-09-01), Gorski
patent: 3549432 (1970-12-01), Sivertsen
patent: 3585088 (1971-06-01), Schwuttke et al.
patent: 3698944 (1972-10-01), Dyer
patent: 4059461 (1977-11-01), Fan et al.
patent: 4099305 (1978-07-01), Cho et al.
patent: 4174422 (1970-11-01), Mathews
patent: 4333792 (1982-06-01), Smith
Growth of Crystals, vol. 10, ed. Sheftal Consultants Bureau N.Y.

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