Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-06-27
2008-08-19
Siek, Vuthe (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C430S005000, C430S396000
Reexamination Certificate
active
07415694
ABSTRACT:
For phase-shifting micro lithography, a method of assigning phase to a set of shifter polygons in a mask layer separated by a set of target features includes assigning a first phase to a first shifter polygon, identifying a set of target features that touch the first shifter polygon, and assigning a second phase to all shifter polygons in the set that touch the set of target features in contact with the first shifter polygon. The set of shifter polygons and the set of target features are separated into aggregates that are spatially isolated from each other such that the phase assignment in one aggregate does not affect the phase assignments in other aggregates. In one embodiment, the first shifter polygon in each aggregate is selected by merging the set of shifter polygons and set of target features into a large polygon, marking a vertex of the large polygon, checking the vertex to make sure it only touches one shifter polygon, and selecting the single shifter polygon touching the vertex as the first shifter polygon.
REFERENCES:
patent: 5308741 (1994-05-01), Kemp
patent: 5342713 (1994-08-01), Ohtsuka et al.
patent: 5523186 (1996-06-01), Lin et al.
patent: 5537648 (1996-07-01), Liebmann et al.
patent: 5538833 (1996-07-01), Ferguson et al.
patent: 5573890 (1996-11-01), Spence
patent: 5636131 (1997-06-01), Liebmann et al.
patent: 5672450 (1997-09-01), Rolfson
patent: 5686208 (1997-11-01), Le et al.
patent: 5718829 (1998-02-01), Pierrat
patent: 5761075 (1998-06-01), Oi et al.
patent: 5858580 (1999-01-01), Wang et al.
patent: 5883813 (1999-03-01), Kim et al.
patent: 5923562 (1999-07-01), Liebmann et al.
patent: 5923566 (1999-07-01), Galan et al.
patent: 6004701 (1999-12-01), Uno et al.
patent: 6057063 (2000-05-01), Liebmann et al.
patent: 6185727 (2001-02-01), Liebmann
patent: 6631510 (2003-10-01), Betz et al.
Gerald Galan et al., “Application of Alternating-Type Phase Shift Mask to Polysilicon Level for Random Logic Circuits”, Japanese Journal of Applied Physics vol. 33 (1994), Part 1, No. 12B, Dec. 1994., pp. 6779-6784.
Tamae Haruki et al., “Algorithm for shifter placement with flexible order prioritizing”, J. Vac. Sci. Technol. B 15(6), Nov./Dec. 1997, pp. 2394-2398.
F.M. Schellenberg et al., “Real and Imaginary Phase-Shifting Masks”, BACUS News, vol. 8, Issue 12, Dec. 1992, pp. 1, 4-11.
Marc D. Levinson, “Improving Resolution in Photolithography with a Phase-Shifting Mask”, IEEE Transaction On Electron Devices, vol. ED-29, No. 12, Dec. 1982, pp. 1828-1982.
Akemi Moniwa et al., “Heuristic Method for Phase-Conflict Minimization in Automatic Phase-Shift Mask Design”, Japanese Journal of Applied Physics, Part 1, vol. 34, No. 12B, pp. 6584-6589, no date.
Kazuko Ooi et al., “Method of Designing Phase-Shifting Masks Utilizing a Compactor”, Japanese Journal of Applied Physics, vol. 33 (1994), Part 1, No. 12B, Dec. 1994, pp. 6774-6778.
Hisashi Watanabe et al., “2×2 Phase Mask for Arbitrary Pattern Formation”, Japanese Journal of Applied Physics, vol. 33, (1994), Part 1. No. 12B, Dec. 1994, pp. 6790-6795.
T. Brunner et al., 170 nm gates fabricated by phase-shift mask and top anti-reflector process, SPIE vol. 1927 Optical/Laser Microlithography VI (1993), pp. 182-189.
Hau-Yu Liu et al., “Fabrication of 0.1 μm T-shaped gates by phase-shifting optical lithography”, SPIE vol. 1927 Optical/Laser Microlithography VI (1993), pp. 42-52.
David M. Newmark, et al. “Phase-shifting mask design tool”, SPIE vol. 1604 11thAnnual BACUS Symposium on Photomask Technology (1991), pp. 226-235.
T.A. Brunner, Session 2, Phase-Shift and Oblique-Illumination Methods, Rim phase-shift mask combined with off-axis illumination: a path to 0.5λ/NA geometries:, SPIE vol. 1927 Optical/Laser Microlithography VI (1993), pp. 54-62.
Dong-Ho Cha et al., “Evaluation of phase-edge phase-shifting mask for sub-0.18 μm gate patterns in logic devices”, SPIE The International Society for Optical Engineering, vol. 3334, pp. 46-54, no date.
Lars W. Liebmann et al., A Comprehensive Evaluation of Major Phase Shift Mask Technologies for Isolated Gate Structures in Logic Designs:, SPIE vol. 2197, pp. 612-623, no date.
Y.C. Pati et al., “Phase-shifting masks for microlithography: automated design and mask requirements”, J. Opt. Soc. Am. A, vol. 11, No. 9, Sep. 1994, pp. 2438-2452.
T. Waas et al., “Automatic Generation of Phase Shift Mask Layouts”, Elsevier Science B.V., Microelectronic Engineering 23 (1994), pp. 139-142.
Masato Shibuya et al., Performance of Resolution Enhancement Technique Using Both Multiple Exposure and Nonlinear Resist, Japanese Journal of Applied Physics vol. 33 (1994), Part 1, No. 12B, Dec. 1994, pp. 6874-6877.
Hideyuki Jinbo et al., “0.2 μm Or Less i-Line Lithography By Phase-Shifting-Mask Technology”, 1990 IEEE, pp. 825-828.
Kazuyuki Inokuchi et al., “Sub-Quarter Micron Gate Fabrication Process Using Phase-Shifting Mask for Microwave GaAs Devices”, Extended Abstracts of the 1991 International Conference on Solid State Devices and Materials, Yokohama, 1991, pp. 92-94.
Hideyuki et al., “Improvement of Phase-Shifter Edge Line Mask Method”, Japanese Journal of Applied Physics, Part 1, vol. 30, No. 11B, Nov. 1991, pp. 2998-3003.
Y.C. Pati et al., “Phase-Shifting Masks: Automated Design and Mask Requirements”, SPIE—The International Society for Optical Engineering, vol. 2197, pp. 314-327, no date.
Kurt Ronse et al., “Comparison of various phase shift strategies and application to 0.35 μm ASIC designs”, SPIE—The International Society of Optical Engineering, vol. 1927, pt. 1 Optical/Laser Microlithography VI (1993), pp. 2-16, vol. 1.
Prosecution History of U.S. Appl. No. 09/608,498, filed Jun. 30, 2000, by Jeff Mayhew, Patent No. 6,493,866, Dec. 10, 2002.
Prosecution History of U.S. Appl. No. 10/315,906, filed Dec. 9, 2002, by Jeff Mayhew, Patent No. 6,918,105 Jul. 12, 2005.
Terasawa, “Subwavelength Lithograpy (PSM,OPC),” IEEE, Jan. 2000, pp. 295-300.
Siek Vuthe
Silicon Valley Patent & Group LLP
Suryadevara Omkar K.
Synopsis Incorporated
LandOfFree
Graph based phase shift lithography mapping method and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Graph based phase shift lithography mapping method and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Graph based phase shift lithography mapping method and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4019494