Graded microstructured layers formed by vacuum etching

Details Graded microstructured layers formed by vacuum etching Graded microstructured layers formed by vacuum etching

1982-02-19

1984-08-14

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 1566591, 156663, 156904, 204192EC, 204192E, 427 38, B44C 122, C03C 1500, C03C 2506

Patent

active

044655517

ABSTRACT:
Into the surface of a material a microstructure determined by an agglomerated thin film is reactively sputter-etched forming a graded-index layer which is useful in optical reflection reduction.
The layer is also useful in the formation of directed crystalline surfaces because of the small structure sizes which can be attained, and because of the anisotropy (directionality) which can be introduced into the etched surface.

REFERENCES:
patent: 4284689 (1981-08-01), Craighead et al.

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