Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Patent
1996-11-14
1998-04-07
Utech, Benjamin
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
438780, 438787, H01L 2100
Patent
active
057364257
ABSTRACT:
This invention has enabled a new, simple nanoporous dielectric fabrication method. In general, this invention uses a glycol, such as ethylene glycol, as a solvent. This new method allows both bulk and thin film aerogels to be made without supercritical drying, freeze drying, or a surface modification step before drying. Prior art aerogels have required at least one of these steps to prevent substantial pore collapse during drying. Thus, this invention allows production of nanoporous dielectrics at room temperature and atmospheric pressure, without a separate surface modification step. Although not required to prevent substantial densification, this new method does not exclude the use of supercritical drying or surface modification steps prior to drying. In general, this new method is compatible with most prior art aerogel techniques. Although this new method allows fabrication of aerogels without substantial pore collapse during drying, there may be some permanent shrinkage during aging and/or drying.
REFERENCES:
patent: 4230803 (1980-10-01), Weidenbach et al.
patent: 4713233 (1987-12-01), Marsh et al.
patent: 4851150 (1989-07-01), Hench et al.
patent: 4954327 (1990-09-01), Blount
patent: 5076980 (1991-12-01), Nogues et al.
patent: 5097317 (1992-03-01), Fujimoto et al.
patent: 5207814 (1993-05-01), Coglaiati et al.
patent: 5242647 (1993-09-01), Poco
patent: 5275796 (1994-01-01), Tillotson et al.
patent: 5294480 (1994-03-01), Mielke et al.
patent: 5368887 (1994-11-01), Hoshino et al.
patent: 5391364 (1995-02-01), Cogliati
patent: 5409683 (1995-04-01), Tillotson et al.
patent: 5470802 (1995-11-01), Gnade et al.
patent: 5472913 (1995-12-01), Havemann et al.
patent: 5488015 (1996-01-01), Havemann et al.
patent: 5494858 (1996-02-01), Gnade et al.
patent: 5496527 (1996-03-01), Yokogawa et al.
patent: 5504042 (1996-04-01), Cho et al.
patent: 5523615 (1996-06-01), Cho et al.
patent: 5525857 (1996-06-01), Gnade et al.
patent: 5536965 (1996-07-01), Beratan et al.
patent: 5548159 (1996-08-01), Jeng
patent: 5561318 (1996-10-01), Gnade et al.
U.S. application No. 08/483,029, Gnade et al., filed Jun. 7, 1995.
U.S. application No. 08/735,758, Gnade et al., filed Oct. 23, 1996.
U.S. application No. 08/476,164, Havemann et al., filed Jun. 7, 1995.
U.S. application No. 08/751,901, Havemann et al., filed Nov. 18, 1996.
H. Yokogawa, M. Yokoyama, Hydrophobic Silic Aerogels, Journal of Non-Crystalline Solids 186 (1995) 23-29.
U.S. application No. 08/662,557, Jeng, filed Jun. 13, 1996.
U.S. application No. 08/594,364, Tigelaar et al., filed Jan. 30, 1996.
U.S. application No. 08/472,683, Gnade et al., filed Jun. 7, 1995.
V.S. Klimenko, L.A. Kulik, and V.V. Vashchinskaya, Dependence of the Composition and Structure of Silicic Acid Xerogels on the Nature of the Solvent, 1986, Ukrainskii Khimicheskii Zhurnal, vol. 52, No. 12, pp. 1247-1251.
D. Basmadjian, G. N. Fulford, B.I. Parsons and D.S. Montgomery, The Control of the Pore, Volume and Pore Size Distribution in Alumina and Silica Gels by the Addition of Water Soluble Organic Polymers Dec. 1962, Journal of Catalysis, vol. 1, No. 6, pp.547-563.
U.S. application No. 08/250,747, Gnade et al., filed May 22, 1994.
U.S. application No. 08/746,689, Gnade et al., filed Nov. 14, 1996.
U.S. application No. 08/748,922, Smith et al., filed Nov. 14, 1996.
U.S. application No. 08/749,186, Smith et al., filed Nov. 14, 1996.
U.S. application No. 08/746,679, Smith et al., filed Nov. 14, 1996.
U.S. application No. 08/746,688, Smith et al., filed Nov. 14, 1996.
U.S. application No. 08/746,680, Smith et al., filed Nov. 14, 1996.
U.S. application No. 08/749,194, Smith et al., filed Nov. 14, 1996.
U.S. application No. 08/748,927, Stoltz et al., filed Nov. 14, 1996.
U.S. application No. 08/748,926, Stoltz et al., filed Nov. 14, 1996.
U.S. application No. 08/749,174, Smith et al., filed Nov. 14, 1996.
U.S. application No. 08/748,921, Smith et al., filed Nov. 14, 1996.
U.S. application No. 08/746, 697, Maskara et al., filed Nov. 14, 1996.
H. Yokogawa, M. Yokoyama, Hydrophobic Silica Aerogels, Journal of Non-Crystalline Solids 186 (1995) 23-29.
Ackerman William C.
Smith Douglas M.
Denker David
Donaldson Richard L.
Maginniss Christopher L.
Texas Instruments Incorporated
Utech Benjamin
LandOfFree
Glycol-based method for forming a thin-film nanoporous dielectri does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Glycol-based method for forming a thin-film nanoporous dielectri, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Glycol-based method for forming a thin-film nanoporous dielectri will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-12678