Global mechanical stop

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Physical stress responsive

Reexamination Certificate

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Details

C438S052000, C257S443000, C257S444000, C257S462000

Reexamination Certificate

active

06962830

ABSTRACT:
Microstructure apparatus and methods are described. An exemplary movable microstructure apparatus includes a base, a plate, and a stop. The plate may be coupled to the base through a flexure, so that the plate is movable between a first angular orientation and a second angular orientation. The stop may be configured to contact the bottom portion of the plate in a contact area when the plate is in the second angular orientation. Alternatively, the stop may be configured to contact the plate in a contact area sized so that upon application of an electrostatic bias between the plate and the stop, a sufficient force holds the plate against the stop. Alternatively, the stop may have a substantially planar surface configured to contact the plate in a contact area sized so that, upon application of a force to the plate substantially normal to the substantially planar surface of the stop, a sufficient force holds the plate against the stop such that the plate lies in a plane substantially parallel to the substantially planar surface of the stop.

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