Glass substrate having circuit pattern and process for...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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Details

C430S330000

Reexamination Certificate

active

07846641

ABSTRACT:
A process for producing a glass substrate having a circuit pattern is disclosed. The process includes forming a thin film layer on a glass substrate and then irradiating the thin film layer with laser light to form a circuit pattern on the glass substrate; depositing a low-melting point glass having a softening point of from450to630° C. on the glass substrate having the circuit pattern formed thereon; and sintering the low-melting point glass to form a low-melting point glass layer which includes the low-melting point glass sintered on the glass substrate having the circuit pattern formed thereon and which forms a compatible layer between the glass substrate and the low-melting point glass layer.

REFERENCES:
patent: 7060411 (2006-06-01), Mitsui et al.
patent: 2003/0030376 (2003-02-01), Aoki et al.
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patent: 2000-348611 (2000-12-01), None
patent: 2001192238 (2001-07-01), None
patent: 2002-260562 (2002-09-01), None
patent: 2003-2692 (2003-01-01), None
patent: 2005-108668 (2005-04-01), None
patent: WO 2005/076292 (2005-08-01), None

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