Glass substrate and leveling thereof

Details Glass substrate and leveling thereof Glass substrate and leveling thereof

2005-02-15

2005-02-15

Hoang, Tu (Department: 3742)

Electric heating

Metal heating

By arc

C219S121410

Reexamination Certificate

active

06855908

ABSTRACT:
A glass substrate having a surface which has been leveled, preferably to a flatness of 0.04-1.3 nm/cm2of the surface, by local plasma etching is provided. A glass substrate whose surface carries microscopic peaks and valleys is leveled by measuring the height of peaks and valleys on the substrate surface, and plasma etching the substrate surface while controlling the amount of plasma etching in accordance with the height of peaks.

REFERENCES:
patent: 4515652 (1985-05-01), Gimpelson et al.
patent: 4632898 (1986-12-01), Fister et al.
patent: 5254830 (1993-10-01), Zarowin et al.
patent: 5444217 (1995-08-01), Moore et al.
patent: 20020155361 (2002-10-01), Takeuchi et al.
patent: 0 317 794 (1989-05-01), None
patent: 0 514 046 (1992-11-01), None
patent: 5160074 (1993-06-01), None
patent: 10273788 (1998-10-01), None
Patent Abstracts of Japan, vol. 1999, No. 01, published Oct. 13, 1998.

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