Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-11-17
1999-02-09
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, C23C 1434
Patent
active
058689109
ABSTRACT:
A single layer film is deposited onto a substrate at room temperature from two sources, one source being a magnetic material, the other being a non-magnetic or weakly-magnetic material. The film is annealed for predetermined time in order to induce phase separation between the magnetic clusters and the non-magnetic matrix, and to form stable clusters of a size such that each magnetic particle, or cluster, comprises a single domain and has no dimensions greater than the mean free path within the particle.
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Nguyen Nam
The Regents of the University of California
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