Generating an optical model for lens aberrations

Details Generating an optical model for lens aberrations Generating an optical model for lens aberrations

2005-08-23

2005-08-23

Whitmore, Stacy A. (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

06934930

ABSTRACT:
Generating an optical model includes receiving lens aberration data associated with a wafer response to lens aberrations. Aberration functions are selected and fit to the lens aberration data. An optical model is generated in accordance to the aberration functions, where the optical model indicates the wafer response to the lens aberrations.

REFERENCES:
patent: 5362585 (1994-11-01), Adams
patent: 6437858 (2002-08-01), Kouno et al.
patent: 2003/0088847 (2003-05-01), Chang et al.
patent: 2004/0167748 (2004-08-01), Zhang et al.
Dusa, “Effects of Lens Aberrations on Critical Dimension Control in Optical Lithography”, Oct. 1997, IEEE CAS '97 Procedding International Semiconductor Conference, vol. 2, pp. 425-429.
Harazaki et al., “High Accurate Optical Proximity Correction under the Influence of Lens Aberration in 0.15 um Logic Process”, Jul. 2000, IEEE 2000 International Microprocesses and Nanotechnology Conference, pp. 14-15.
Detje et al., “Exposure Tool Effects on OPC”, Nov. 2002, IEEE 2002 International Microprocesses and Nanotechnology Conference, Digest of Papers, pp. 298.
FringeSoft, Zernike and Seidel Polynomials, Zernike polynomials, http://www.fringesoft.com/siedel.htm; copyright 2000 FringeSoft; 2 pages, Jun. 28, 2000.
Gennari, Frank E., “Validation of the aberration pattern-matching OPC strategy,” Design, Process Integration, and Characterization for Microelectronics, Alexander Starikov, Kenneth W. Tobin, Jr., Editors, Proceedings of SPIE vol. 4692, pp. 444-453, 2002.
Calibre OPC and PSM, Manufacturability Datasheet, “Calibre OPC and PSM: Enabling Silicon Accuracy, Speed and Yield from 180nm to 65nm,” Mentor Graphics, Mentor Graphics Corporation, www.mentor.com/dsm, 6 pages, Apr. 2003.

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