Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-06-03
2008-10-21
Chiang, Jack (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000
Reexamination Certificate
active
07441211
ABSTRACT:
Methods and apparatus for a gate-length biasing methodology for optimizing integrated digital circuits are described. The gate-length biasing methodology replaces a nominal gate-length of a transistor with a biased gate-length, where the biased gate-length includes a bias length that is small compared to the nominal gate-length. In an exemplary embodiment, the bias length is less than 10% of the nominal gate-length.
REFERENCES:
patent: 6954918 (2005-10-01), Houston
patent: 7222328 (2007-05-01), Hasumi et al.
Gupta, P. et al., “Joining the Design and Mask Flows for Better and Cheaper Masks,” Proc. 24thBACUS Symposium on Photomask Technology and Management, Sep. 2004, 12 pages.
Gupta, P. et al., “Selective Gate-Length Biasing for Cost-Effective Runtime Leakage Control,” DAC 2004, Jun. 7-11, 2004, pp. 327-330, San Diego, CA.
Clark, L. et al., “Managing Standby and Active Mode Leakage Power in Deep Sub-micron Design”, Proceedings IEEE International Symposium on Low Power Electronic Design, 2004, pp. 275-279.
Gupta Puneet
Kahng Andrew B
Blaze DFM, Inc.
Chiang Jack
Doan Nghia M
Fenwick & West LLP
LandOfFree
Gate-length biasing for digital circuit optimization does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gate-length biasing for digital circuit optimization, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gate-length biasing for digital circuit optimization will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4005511