Gate layer diode method and apparatus

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S355000, C257S356000, C257SE23080, C257SE29195, C257SE29328, C438S369000, C438S372000

Reexamination Certificate

active

07439591

ABSTRACT:
Method, apparatus, and article of manufacture for a diode defined by a portion of a gate layer of an integrated circuit. Illustrative, non-limiting embodiments of the invention are provided, including a temperature compensated DRAM, a temperature compensated CPU, a temperature compensated logic circuit and other on-chip temperature sensor applications.

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Carl-Mikael Zetterling,Process Technology for Silicon Carbide Devices, Docent Seminar, Mar. 21, 2000, Kungl Teknishka Högskolan.

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