Gate-enhanced junction varactor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S595000, C257SE27049

Reexamination Certificate

active

07579642

ABSTRACT:
A semiconductor junction varactor utilizes gate enhancement for enabling the varactor to achieve a high ratio of maximum capacitance to minimum capacitance.

REFERENCES:
patent: 4003009 (1977-01-01), Watanabe
patent: 4529994 (1985-07-01), Sakai
patent: 4754310 (1988-06-01), Coe
patent: 5399893 (1995-03-01), Weitzel et al.
patent: 5497028 (1996-03-01), Ikeda et al.
patent: 5504376 (1996-04-01), Sugahara et al.
patent: 5659185 (1997-08-01), Iwamuro
patent: 5977591 (1999-11-01), Fratin et al.
patent: 6100770 (2000-08-01), Litwin et al.
patent: 6165902 (2000-12-01), Pramanick et al.
patent: 6166404 (2000-12-01), Imoto et al.
patent: 6172378 (2001-01-01), Hull et al.
patent: 6455902 (2002-09-01), Voldman
patent: 6521506 (2003-02-01), Coolbaugh et al.
patent: 6667506 (2003-12-01), Reedy et al.
patent: 6943399 (2005-09-01), Gau
patent: 6949440 (2005-09-01), Gau
patent: 7078787 (2006-07-01), Bulucea
patent: 7081663 (2006-07-01), Bulucea
patent: 7235862 (2007-06-01), Bulucea
patent: 2002/0036311 (2002-03-01), Hattori
patent: 2003/0052388 (2003-03-01), Mheen et al.
patent: 2003/0085449 (2003-05-01), Adler
patent: 2003/0178689 (2003-09-01), Maszara et al.
patent: 4-199682 (1992-07-01), None
patent: 6-61446 (1994-03-01), None
patent: 7-226643 (1995-08-01), None
Sedra et al.,Microelectronic Circuits(4th ed., Oxford Univ. Press), 1998, p. 382.
Andreani et al., “A 1.8-GHZ CMOS VCO Tuned by an Accumulation-Mode MOS Varactor,” IEEE Intl. Symposium on Circuits and Systems, May 28-31, 2000, pp. I-315-I-318.
Grove,Physics and Technology of Semiconductor Devices(John Wiley & Sons), 1967, pp. 263-305.
Grove et al., “Effect of Surface Fields on the Breakdown Voltage of Planar Siliconp-nJunction,”IEEE Trans. Electron Devices, vol. ED-14, 1967, pp. 157-162.
Grove et al., “Surface Effects onp-nJunctions: Characteristics of Surface Space-Charge Regions Under Non-Equilibrium Conditions,”Solid-State Electronics, vol. 9, 1966, pp. 783-806.
Kral et al., “RF-CMOS Oscillators with Switched Tuning,”Procs. IEEE Custom Integrated Circuits Conference, 1998, pp. 555-558.
Lee,The Design of CMOS Radio-Frequency Integrated Circuits(Cambridge Univ. Press), 1998, p. 37-41 and 504-514.
McMahon et al., “Voltage-Sensitive Semiconductor Capacitors,”1958 IRE Wescon Conf. Rec., Part 3, Aug. 19-22, 1958, pp. 72-82.
Moll, “Variable Capacitance With Large Capacity Change,”IRE Wescon Conf. Rec., vol. 3, 1959, pp. 32-36.
Ng,Complete Guide to Semiconductor Devices(McGraw Hill), 1995, pp. 11-22.
Razavi,Design of Analog CMOS Integrated Circuits(McGraw Hill), 2001, pp. 495-525.
Rusu et al., “Deep-Depletion Breakdown Voltage of Silicon-Dioxide/Silicon MOS Capacitors,”IEEE Trans. Elec. Devs., Mar. 1979, pp. 201-205.
Rusu et al., “Reversible Breakdown Voltage Collapse in Silicon Gate-Controlled Diodes,”Solid-State Electronics, vol. 23, 1980, pp. 473-480.
Svelto et al., “A Three Terminal Varactor for RF IC's in Standard CMOS Technology,”IEEE Transactions on Electron Devices, vol. 47, 2000, pp. 893-895.
Warner et al.,Transistors—Fundamentals for the Integrated-Circuit Engineer(John Wiley & Sons), 1983, pp. 320-321.
Wong et al., “A Wide Tuning Range Gated Varactor,”IEEE J. Solid State Circs, May 2000, pp. 773-779.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gate-enhanced junction varactor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gate-enhanced junction varactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gate-enhanced junction varactor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4122788

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.