Gas treatment method and computer readable storage medium

Details Gas treatment method and computer readable storage medium Gas treatment method and computer readable storage medium

2011-03-15

2011-03-15

Vu, David (Department: 2829)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S775000, C257SE21006

Reexamination Certificate

active

07906442

ABSTRACT:
A gas delivery apparatus comprises: a chamber surrounding a substrate to be processed; a showerhead disposed within the chamber; and gas supply means supplying a gas comprising a mixture of NH3and H2to the chamber, in which a coating layer deposited on the interior of the chamber and the showerhead contain nickel (Ni). When the apparatus is utilized to practice a method comprising exposing an object W to a gas comprising a mixture consisting of NH3and H2, the H2/NH3gas flow rate ratio and the temperature are controlled so that the reaction of nickel contained in the coating layer deposited on the interior of the chamber and the showerhead is suppressed.

REFERENCES:
patent: 61 229319 (1986-10-01), None
patent: 2931173 (1999-05-01), None
patent: 2931173 (1999-05-01), None
patent: 2003 313666 (2003-11-01), None
patent: 2003313666 (2003-11-01), None

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