Gas supplying system and gas supplying apparatus

Details Gas supplying system and gas supplying apparatus Gas supplying system and gas supplying apparatus

1993-01-28

1994-11-29

Hepperle, Stephen M.

Fluid handling

With cleaner, lubrication added to fluid or liquid sealing...

Cleaning or steam sterilizing

137597, 13762418, F16K 1120

Patent

active

053680626

ABSTRACT:
A gas supplying system for supplying a corrosive gas or the like to a semiconductor manufacturing apparatus or the like. A plurality of kinds of component gases are introduced into a chamber and mixed therein to form a desired supply gas. After supplying the desired supply gas, the chamber is evacuated and an inert gas is charged into the chamber to substitute a residual supply gas remaining in the chamber by the inert gas. The evacuation of the chamber and the charging of the inert gas into the chamber are repeated two or more times. Accordingly, the residual supply gas can be efficiently removed from the chamber and substituted by the inert gas.

REFERENCES:
patent: 4064898 (1977-12-01), Petersen et al.
patent: 4383547 (1983-05-01), Lorenz et al.
patent: 4572230 (1986-02-01), Mirabile
patent: 4741354 (1988-05-01), De Mild
patent: 4917136 (1990-04-01), Ohmi et al.
patent: 5137047 (1992-08-01), George

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