Gas supplying apparatus

Details Gas supplying apparatus Gas supplying apparatus

2007-12-04

2007-12-04

Ganey, Steven J. (Department: 3752)

Fluid sprinkling, spraying, and diffusing

Processes

C239S390000, C239S543000, C239S545000, C239S549000, C239S561000, C239S567000, C239S600000, C118S715000

Reexamination Certificate

active

10801852

ABSTRACT:
A gas supplying apparatus for supplying deposition gas onto a substrate surface, the gas supplying apparatus comprising: a gas supplying ring with one or more gas supplying channels formed along the interior of the gas supplying ring and with a plurality of gas distribution channels directed toward a center of the gas supplying ring; and a plurality of adapters with gas nozzles connecting to the gas distribution channels, respectively, that detachably connect to the interior of the gas supplying ring, wherein the gas nozzles have a variety of injection configurations.

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Japanese Office for Japanese Patent Application No. 2003-349921 dated Oct. 3, 2006 which corresponds to the present application.

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