Gas seal for continuous chemical vapor deposition reactors

Details Gas seal for continuous chemical vapor deposition reactors Gas seal for continuous chemical vapor deposition reactors

1992-01-29

1994-05-17

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Chamber seal

118719, C23C 1600

Patent

active

053124901

ABSTRACT:
Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.

REFERENCES:
patent: 4048955 (1977-09-01), Anderson

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