Gas scrubbing system

Details Gas scrubbing system Gas scrubbing system

1976-10-29

1978-06-20

Lechert, Jr., Stephen J.

Compositions

Co, s, negative element, or acid, bindant containing

252389R, 252390, 252391, 252392, 203 7, 423228, 423229, 21 25R, 21 27R, C09K 300

Patent

active

040960854

ABSTRACT:
An aqueous organic amine acid gas scrubbing system, particularly an aqueous N-methyldiethanolamine or diethanolamine acid gas scrubbing system having incorporated therein (1) a compound or mixture of compounds having the formula ##STR1## wherein n is an integer from 1 to 3, m is an integer from 2 to a number sufficient to yield a molecular weight of about 800, R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are each independently selected from the group consisting of --H, --C.sub.n' H.sub.2n' OH, --C.sub.n' H.sub.2n'+1, --C.sub.n' H.sub.2n' N(R.sub.3)R.sub.4 wherein n' is an integer from 1 to 2 and wherein R.sub.1 -R.sub.3 and R.sub.2 -R.sub.4 may be joined to form cyclic amines when n is 2; said compound being present in about 10 to about 2000 parts per million parts of treating solution; (2) copper or a copper ion yielding compound in from 0 to 1000 ppm; and (3) sulfur or a sulfur atom yielding compound in from 0 to 1000 ppm.

REFERENCES:
patent: 3959170 (1976-05-01), Mago et al.

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