Coating apparatus – Gas or vapor deposition
Patent
1996-11-05
1999-09-28
Breneman, Bruce
Coating apparatus
Gas or vapor deposition
62 482, 62614, 62616, C23C 1600
Patent
active
059581387
ABSTRACT:
Provided is a gas recovery unit which is more efficient in its recovery and less expensive to run. The gas recovery unit comprises a CVD device, an exhaust gas recovery part and an exhaust gas purification part. The exhaust gas recovery part is constructed so as to have an inert gas reservoir part capable of accommodating liquid nitrogen, to have an exhaust gas supply part for supplying an exhaust gas to said inert gas reservoir part so that it can be brought in gasliquid contact with the liquid nitrogen, and to have a recovered and liquefied gas discharge part for discharging the recovered and liquefied gas which has been liquefied in the inert gas reservoir part. The exhaust gas purification part is constructed so as to have a recovered and liquefied gas reception part, an evaporator and a condenser for carrying out a heat exchange between said liquid nitrogen and the recovered and liquefied gas which has been evaporated, and cleaning gas recovery parts, and to have a cooling inert gas discharge part, wherein the cooling inert gas discharge part is connected to the inert gas supply path.
REFERENCES:
patent: 4549889 (1985-10-01), Yamazaki
patent: 5250323 (1993-10-01), Miyazaki
patent: 5426945 (1995-06-01), Menzenski
Nozawa Shigeyoshi
Tomita Shinji
Breneman Bruce
Fieler Enh
Teisan Kabushiki Kaisha
LandOfFree
Gas recovery unit does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas recovery unit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas recovery unit will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-698448