Gas purge protection of sensors and windows in a gas phase proce

Details Gas purge protection of sensors and windows in a gas phase proce Gas purge protection of sensors and windows in a gas phase proce

1997-12-31

2000-06-06

Krynski, William

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118715, 118719, 162 43, 162237, 162249, 20429831, 20429833, 134 1, C23F 102

Patent

active

060713755

ABSTRACT:
A gas purged viewport for endpoint detection in a gas phase processing chamber is provided which prevents contamination of an optical monitoring window by use of a purge gas flow. The purge gas purges the viewport and prevents deposition of byproducts and contaminants on the window which will adversely effect endpoint detection. The gas purge viewport includes a prechamber between the optically transparent window and the process chamber. The purge gas is passed through the prechamber and into the processing chamber to purge the window. The gas purge system may also be used to purge other parts such as sensors.

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