Gas-phase growth process and an apparatus for the same

Coating processes – Electrical product produced – Welding electrode

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118 501, B05D 306

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active

047312556

ABSTRACT:
A gas-phase growth process for growing films of uniform thickness or having a prescribed pattern form or growing films sequentially onto a substrate and an apparatus related thereto. The films are grown by allowing an inert gas to flow over a reaction gas flow in parallel to the surface of the substrate. Optionally, the substrate surface could be irradiated by a UV light source which is directed from above the inert gas toward the substrate surface.

REFERENCES:
patent: 3200018 (1965-08-01), Grossman
patent: 3271180 (1966-09-01), White
patent: 3364087 (1968-01-01), Solomon et al.
patent: 4331485 (1982-05-01), Gat
patent: 4435445 (1984-03-01), Allred
patent: 4454835 (1984-06-01), Walsh et al.
patent: 4500565 (1985-02-01), Hiramoto

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