Gas-phase fluorination process

Details Gas-phase fluorination process Gas-phase fluorination process

1990-01-16

1991-06-25

Evans, J. E.

Organic compounds -- part of the class 532-570 series

Organic compounds

Halogen containing

570166, C07C 1704, C07C 1720, C07C 1902

Patent

active

050269305

ABSTRACT:
An improved gas-phase process for the manufacture of 1,1-difluoro-1,2-dichloroethane and/or 1-fluoro-1,1,2-trichloroethane by contacting a suitable trihaloethylene and/or a tetrahaloethane with hydrogen fluoride in the presence of a metal in combination with a high fluorine content aluminum-containing compound, the reaction being preferably conducted under controlled conditions whereby the production of 1,1,1-trifluorochloroethane is minimized.

REFERENCES:
patent: 3258500 (1966-06-01), Swamer et al.
patent: 3755477 (1973-08-01), Firth et al.
patent: 4766259 (1988-09-01), Manzer et al.

Affiliated with

Also associated with

Rating

Gas-phase fluorination process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas-phase fluorination process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas-phase fluorination process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1041776