Radiant energy – Fluent material containment – support or transfer means – With irradiating source or radiating fluent material
Reexamination Certificate
2007-08-31
2010-02-02
Souw, Bernard E (Department: 2881)
Radiant energy
Fluent material containment, support or transfer means
With irradiating source or radiating fluent material
C250S428000, C250S50400H
Reexamination Certificate
active
07655925
ABSTRACT:
Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
REFERENCES:
patent: 4223279 (1980-09-01), Bradford, Jr. et al.
patent: 4247829 (1981-01-01), Yagi et al.
patent: 4251781 (1981-02-01), Sutter, Jr.
patent: 4414488 (1983-11-01), Hoffmann et al.
patent: 4455658 (1984-06-01), Sutter, Jr.
patent: 4546482 (1985-10-01), Bagaglia et al.
patent: 4686682 (1987-08-01), Haruta et al.
patent: 4703490 (1987-10-01), Brumme et al.
patent: 4742527 (1988-05-01), Wiedemann et al.
patent: 4774714 (1988-09-01), Javan
patent: 4860300 (1989-08-01), Baumler et al.
patent: 4876693 (1989-10-01), Lucero et al.
patent: 4953174 (1990-08-01), Eldridge et al.
patent: 4959840 (1990-09-01), Akins et al.
patent: 5023884 (1991-06-01), Akins et al.
patent: 5025445 (1991-06-01), Anderson et al.
patent: 5025446 (1991-06-01), Kuizenga
patent: 5048041 (1991-09-01), Akins et al.
patent: 5070513 (1991-12-01), Letardi
patent: 5187716 (1993-02-01), Haruta et al.
patent: 5189678 (1993-02-01), Ball et al.
patent: 5247534 (1993-09-01), Muller-Horsche
patent: 5313481 (1994-05-01), Cook et al.
patent: 5315611 (1994-05-01), Ball et al.
patent: 5359620 (1994-10-01), Akins et al.
patent: 5448580 (1995-09-01), Birx et al.
patent: 5471965 (1995-12-01), Kapich
patent: 5535233 (1996-07-01), Mizoguchi et al.
patent: 5557629 (1996-09-01), Mizoguchi et al.
patent: 5646954 (1997-07-01), Das et al.
patent: 5729565 (1998-03-01), Meller et al.
patent: 5763930 (1998-06-01), Partlo
patent: 5771258 (1998-06-01), Morton et al.
patent: 5852621 (1998-12-01), Sandstrom
patent: 5863017 (1999-01-01), Larson et al.
patent: 5875207 (1999-02-01), Osmanow
patent: 5940421 (1999-08-01), Partlo et al.
patent: 5953360 (1999-09-01), Vitruk et al.
patent: 6005879 (1999-12-01), Sandstrom et al.
patent: 6016325 (2000-01-01), Ness et al.
patent: 6018537 (2000-01-01), Hofmann et al.
patent: 6028880 (2000-02-01), Carlesi et al.
patent: 6034978 (2000-03-01), Ujazdowski et al.
patent: 6051841 (2000-04-01), Partlo
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6067311 (2000-05-01), Morton et al.
patent: 6094448 (2000-07-01), Fomenkov et al.
patent: 6104735 (2000-08-01), Webb
patent: 6109574 (2000-08-01), Pan et al.
patent: 6128323 (2000-10-01), Myers et al.
patent: 6151349 (2000-11-01), Gong et al.
patent: 6164116 (2000-12-01), Rice et al.
patent: 6192064 (2001-02-01), Algots et al.
patent: 6200466 (2001-03-01), Bender
patent: 6208674 (2001-03-01), Webb et al.
patent: 6208675 (2001-03-01), Webb
patent: 6212211 (2001-04-01), Azzola et al.
patent: 6219368 (2001-04-01), Govorkov
patent: 6240117 (2001-05-01), Gong et al.
patent: 6317447 (2001-11-01), Partlo et al.
patent: 6359969 (2002-03-01), Shmaenok
patent: 6414979 (2002-07-01), Ujazdowski et al.
patent: 6452199 (2002-09-01), Partlo et al.
patent: 6466602 (2002-10-01), Fleurov et al.
patent: 6477193 (2002-11-01), Oliver et al.
patent: 6493374 (2002-12-01), Fomenkov et al.
patent: 6541786 (2003-04-01), Partlo et al.
patent: 6549551 (2003-04-01), Ness et al.
patent: 6556612 (2003-04-01), Ershov et al.
patent: 6567450 (2003-05-01), Myers et al.
patent: 6576912 (2003-06-01), Visser et al.
patent: 6614505 (2003-09-01), Koster et al.
patent: 6618421 (2003-09-01), Das et al.
patent: 6625191 (2003-09-01), Knowles et al.
patent: 6635844 (2003-10-01), Yu
patent: 6693939 (2004-02-01), Klene et al.
patent: 6738452 (2004-05-01), McGregor et al.
patent: 6782031 (2004-08-01), Hofmann et al.
patent: 6815700 (2004-11-01), Melnychuk et al.
patent: 6928093 (2005-08-01), Webb et al.
patent: 6972421 (2005-12-01), Melnychuk et al.
patent: 6987279 (2006-01-01), Hoshino et al.
patent: 7002168 (2006-02-01), Jacob et al.
patent: 7026629 (2006-04-01), Bakker et al.
patent: 7068697 (2006-06-01), Amada et al.
patent: 7087914 (2006-08-01), Akins et al.
patent: 7112804 (2006-09-01), Horsky et al.
patent: 7135693 (2006-11-01), Roux
patent: 7136141 (2006-11-01), Bakker
patent: 7164144 (2007-01-01), Partlo et al.
patent: 7196342 (2007-03-01), Ershov et al.
patent: 7217940 (2007-05-01), Partlo et al.
patent: 7217941 (2007-05-01), Rettig et al.
patent: 7230258 (2007-06-01), Ruzic et al.
patent: 7251012 (2007-07-01), Banine et al.
patent: 7271401 (2007-09-01), Imai et al.
patent: 7315346 (2008-01-01), Van Beek et al.
patent: 7361918 (2008-04-01), Akins et al.
patent: 7365349 (2008-04-01), Partlo et al.
patent: 7368741 (2008-05-01), Melnychuk et al.
patent: 7372056 (2008-05-01), Bykanov et al.
patent: 7378673 (2008-05-01), Bykanov et al.
patent: 7394083 (2008-07-01), Bowering et al.
patent: 7405416 (2008-07-01), Algots et al.
patent: 7415056 (2008-08-01), Das et al.
patent: 7479643 (2009-01-01), Horsky
patent: 2005/0259709 (2005-11-01), Das et al.
patent: 2006/0012761 (2006-01-01), Bakker et al.
patent: 2006/0175558 (2006-08-01), Bakker et al.
patent: 2006/0219957 (2006-10-01), Ershov et al.
patent: 2006/0249699 (2006-11-01), Bowering et al.
patent: 2006/0250599 (2006-11-01), Bakker et al.
patent: 2006/0255298 (2006-11-01), Bykanov et al.
patent: 2006/0268246 (2006-11-01), Jacobs et al.
patent: 2007/0001131 (2007-01-01), Ershov et al.
patent: 2007/0102653 (2007-05-01), Bowering et al.
patent: 2007/0145297 (2007-06-01), Freriks et al.
patent: 2007/0158594 (2007-07-01), Shirai et al.
patent: 2007/0228298 (2007-10-01), Komori et al.
patent: 2007/0291279 (2007-12-01), Rafac
patent: 2007/0291350 (2007-12-01), Ershov et al.
patent: 2008/0043321 (2008-02-01), Bowering et al.
patent: 2008/0048133 (2008-02-01), Bykanov et al.
patent: 2008/0087847 (2008-04-01), Bykanov et al.
patent: 2008/0147241 (2008-06-01), Tsangaris et al.
patent: 2008/0149862 (2008-06-01), Hansson et al.
patent: 2008/0179548 (2008-07-01), Bykanov et al.
patent: 2008/0209807 (2008-09-01), Tsangaris et al.
patent: 2009/0014668 (2009-01-01), Vaschenko
patent: 2009/0054642 (2009-02-01), Ryu et al.
patent: 2009/0057567 (2009-03-01), Bykanov et al.
patent: 2009/0104462 (2009-04-01), Windt
patent: 2009/0154642 (2009-06-01), Bykanov et al.
patent: 1434095 (2004-06-01), None
patent: 1674932 (2008-01-01), None
patent: 2007-220949 (2003-08-01), None
patent: 2006-329664 (2006-12-01), None
patent: 2007-317598 (2007-12-01), None
patent: WO 2006/011664 (2006-02-01), None
U.S. Appl. No. 11/786,145, filed Apr. 10, 2007, Bykanov et al.
U.S. Appl. No. 11/827,803, filed Jul. 13, 2007, Vaschenko.
Harilal, et al., “Ion debris mitigation from tin plasma using ambient gas, magnetic field and combined effects,” J. Appl. Phys. B—Lasers and Optics, pp. 1-7;Center for Energy Research, Univ. of Calif., San Diego (2006).
Harilal, et al., “Spectroscopic characterization of laser-induced tin plasma,” J. of Appl. Phys. 98 (1), 013306, pp. 1-7,Univ. of Calif. Postprints, paper 857 (2005).
Harilal, et al., “Debris mitigation in a laser-produced tin plume using a magnetic field,” J. of App. Phys., 98, 036102, pp. 1-3,American Institute of Physics(2005).
Harilal, et al., “Ambient gas effects on the dynamics of laser-produced tin plume expansion,” J. of App. Physics, 99, 083303, pp. 1-10,American Institute of Physics(2006).
Hershcovitch, “High-pressure arcs as vacuum-atmosphere interface and plasma lens for nonvacuum electron beam welding machines, electron beam melting, and nonvacuum ion material modification,” J. Appl. Phys. 78 (9), pp. 5283-5288,American Institute of Physics(1995).
Tao, et al., “Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithog
Brandt David C.
Bykanov Alexander N.
Ershov Alexander I.
Fomenkov Igor V.
Cymer Inc.
Hillman Matthew K.
Souw Bernard E
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