Gas laser apparatus for lithography

Details Gas laser apparatus for lithography Gas laser apparatus for lithography

2005-07-26

2005-07-26

Harvey, Minsun Oh (Department: 2828)

Coherent light generators

Particular active media

Gas

C372S057000, C372S058000, C372S059000, C372S060000, C372S090000

Reexamination Certificate

active

06922428

ABSTRACT:
The present invention relates to a long pulse gas laser apparatus for lithography further improved in the laser oscillation efficiency and stability increased by addition of xenon gas. A gas laser apparatus for lithography has a pair of discharge electrodes2provided in a laser chamber1and emits laser beam having a laser pulse width (Tis) of not less than 40 ns by exciting a laser gas sealed in the laser chamber1by electric discharge between the pair of discharge electrodes2, the laser gas containing xenon in an amount not less than 2 ppm and not more than 100 ppm in partial pressure ratio. The laser gas has been heated at least when the laser beam is emitted.

REFERENCES:
patent: 4387462 (1983-06-01), Markus
patent: 5962857 (1999-10-01), McKeever et al.
patent: 6014398 (2000-01-01), Hofmann et al.
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6188710 (2001-02-01), Besaucele et al.
patent: 6584131 (2003-06-01), Kakizaki

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