Coating apparatus – Gas or vapor deposition
Patent
1995-06-07
1999-06-29
Breneman, Bruce
Coating apparatus
Gas or vapor deposition
118726, C23C 1600
Patent
active
059163690
ABSTRACT:
A system of supplying processing fluid to a substrate processing apparatus having walls, the inner surfaces of which define a processing chamber in which a substrate supporting susceptor is located. The system consists of a number of fluid storages, each which stores a separate processing fluid, at least two fluid conduits along which processing fluid flows from the fluid storages to the processing apparatus and a fluid inlet which connects the fluid conduits to the processing chamber. The inlet has a separate fluid passage, corresponding to each of the fluid conduits, formed along it. Each fluid passage opens at or near an inner surface of a wall to together define a fluid mixing zone, so that fluid moving along one fluid passage is prevented from mixing with fluid moving along any other passage until reaching the mixing zone.
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Anderson Roger N.
Carlson David K.
Hey Peter W.
Riley Norma
Venkatesan Mahalingam
Applied Materials Inc.
Breneman Bruce
Lund Jeffrie R
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