Gas inlet apparatus and method for chemical vapor deposition rea

Details Gas inlet apparatus and method for chemical vapor deposition rea Gas inlet apparatus and method for chemical vapor deposition rea

1997-04-07

1999-03-30

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

4272481, C23C 1600

Patent

active

058883037

ABSTRACT:
A gas inlet apparatus and method for introducing gas streams into the process chamber of a chemical vapor deposition reactor. The inlet includes conduits that are coaxially arranged and spaced radially apart, with the passageways formed therebetween carrying the gas streams. A conical surface is provided at the stream-exiting end of the inlet so that gases impinge upon it and are then dispersed within the reactor.

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