Gas injectors for a vertical furnace used in semiconductor...

Details Gas injectors for a vertical furnace used in semiconductor... Gas injectors for a vertical furnace used in semiconductor...

2005-08-16

2005-08-16

Zervigon, Rudy (Department: 1763)

Coating apparatus

Gas or vapor deposition

C118S724000

Reexamination Certificate

active

06929699

ABSTRACT:
Improved long gas injectors for a vertical furnace used in semiconductor wafer processing are useful to minimize particulate contamination in the wafer processing area of the furnace, and minimize distortion of the long injectors during thermal excursions. The improved injectors are fabricated with a stabilizing quartz standoff positioned near the onset of the vertical portion of the injector tube which adds support to the long tube. Thickness of the standoff is calculated to define and enforce a specified separation distance between liner and injector, as well as to provide dual alignment points at the base of the liner and at the tip of the injector.

REFERENCES:
patent: 5478397 (1995-12-01), Shibata et al.
patent: 2003/0015138 (2003-01-01), Tometsuka

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