Gas handling device assembly used for a CVD apparatus

Coating apparatus – Gas or vapor deposition

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Details

137884, C23C 1600

Patent

active

054889251

ABSTRACT:
There is provided a gas handling device assembly of which one of gas handling devices can be removed from the gas handling device assembly without loosening other component devices. The gas handling device assembly has a base plate having a top surface and a bottom surface opposite to the top surface. A plurality of through holes extending from the top surface to the bottom surface are formed in the base plate so that the gas flows through the through holes. There is provided a gas-handling device having a mount surface via which the gas-handling device is fixed to the base plate, an inlet port and an outlet port for the gas being formed on the mount surface so that each of the inlet port and the outlet port is connected to one of through holes of the base plate. There is also provided a connecting tube having a first connecting member on one end and a second connecting member on the other end, the first connecting member and the second connecting member facing toward the same direction. The gas handling device is fixed to the top surface of the base plate, and the connecting tube is fixed to the bottom surface of the base plate so that the gas handling device, the through holes, and the connecting tube, together form a predetermined gas-flow circuit.

REFERENCES:
patent: 3654960 (1972-04-01), Kiernan
patent: 3665961 (1972-05-01), Bachmann
patent: 3698432 (1972-10-01), Kutz
patent: 3756274 (1973-09-01), Wolfgramm
patent: 4183373 (1980-01-01), Kay
patent: 4369031 (1983-01-01), Goldman
patent: 5025834 (1991-06-01), Stoll
patent: 5215588 (1993-06-01), Rhieu
patent: 5250323 (1993-10-01), Miyazaki
patent: 5252134 (1993-10-01), Stauffer
patent: 5282488 (1994-02-01), Roth
Hydraulics & Pneumatics, What Can You Get In Manifolds vol. 16 No. 11 Nov. 63 pp. 88-89.

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