Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Reexamination Certificate
2007-01-30
2007-01-30
Ahmed, Shamim (Department: 1765)
Cleaning and liquid contact with solids
Processes
Hollow work, internal surface treatment
C134S001000, C134S001300, C134S037000, C216S058000, C438S706000, C438S710000, C438S905000, C252S079100, C252S079300
Reexamination Certificate
active
10705532
ABSTRACT:
The invention relates to a gas for removing deposits by a gas-solid reaction. This gas includes a hypofluorite that is defined as being a compound having at least one OF group in the molecule. Various deposits can be removed by the gas, and the gas can easily be made unharmful on the global environment after the removal of the deposits, due to the use of a hypofluorite. The gas may be a cleaning gas for cleaning, for example, the inside of an apparatus for producing semiconductor devices. This cleaning gas comprises 1–100 volume % of the hypofluorite. Alternatively, the gas of the invention may be an etching gas for removing an unwanted portion of a film deposited on a substrate. The unwanted portion can be removed by this etching gas as precisely as originally designed, due to the use of a hypofluorite. The invention further relates to a method for removing a deposit by the gas. This method includes the step (a) bringing the gas into contact with the deposit, thereby to remove the deposit by a gas-solid reaction.
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Mouri Isamu
Ohashi Mitsuya
Tamura Tetsuya
Ahmed Shamim
Central Glass Company Limited
Crowell & Moring LLP
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