4. Chemistry of inorganic compounds
  5. Halogen or compound thereof
  6. Binary fluorine containing compound

Mitsuya Ohashi

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Cleaning gas

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Cleaning gas and method for cleaning vacuum treatment...

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Reexamination Certificate

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Gas for removing deposit and removal method using same

Compositions – Etching or brightening compositions – Inorganic acid containing
Reexamination Certificate

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Gas for removing deposit and removal method using same

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Reexamination Certificate

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Gas for removing deposit and removal method using same

Etching a substrate: processes – Gas phase etching of substrate
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1637750

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