Gas feeding device for controlled vaporization of an organanomet

Details Gas feeding device for controlled vaporization of an organanomet Gas feeding device for controlled vaporization of an organanomet

1995-05-11

1998-07-14

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

118715, 261 361, 261 81, 261DIG48, C23C 1600

Patent

active

057798044

ABSTRACT:
A gas-feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising a container having a space for discharging the starting gas containing an organometallic compound by introduction of a carrier gas; a gas-introducing means connected to the container for introducing a carrier gas is described. A plurality of openings for introducing the organometallic compound into the container is also provided, wherein each opening is part of an atomizer employing a piezoelectric element to eject the organometallic compound in a mist state into the container where the carrier gas passes through the space, and a container is provided for storing the organometallic compound.

REFERENCES:
patent: 3016233 (1962-01-01), Olmstead
patent: 3967549 (1976-07-01), Thompson
patent: 4011157 (1977-03-01), Pennebaker et al.
patent: 4529427 (1985-07-01), French
patent: 4842893 (1989-06-01), Yializis
patent: 4929319 (1990-05-01), Dinter
patent: 4940521 (1990-07-01), Dinter
patent: 4954371 (1990-09-01), Yializis
patent: 5026463 (1991-06-01), Dinter
patent: 5034372 (1991-07-01), Matsuno
patent: 5097800 (1992-03-01), Shaw
patent: 5476547 (1995-12-01), Mikoshiba

Affiliated with

Also associated with

Rating

Gas feeding device for controlled vaporization of an organanomet does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas feeding device for controlled vaporization of an organanomet, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas feeding device for controlled vaporization of an organanomet will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1877896