Gas-etching device

Details Gas-etching device Gas-etching device

1978-08-15

1980-03-11

Edmundson, F. C.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 204164, H01L 21302, B44C 122, B01K 100

Patent

active

041927060

ABSTRACT:
A gas etching device comprises a vacuum vessel provided with a means for supplying into the vacuum vessel a gas containing therein oxygen atoms and a gas containing therein fluorine atoms, an etching gas-producing region provided within the vacuum vessel and provided with an exciting means for exciting said gases, and a reaction region provided within the vacuum vessel and disposed at a position spaced apart from the etching gas-producing region and having disposed therein a material to be etched. By the use of this device, etching can be performed with no deterioration of a resist, accordingly with success in fine fabrication, and with no damages to the material to be etched. Further, during the etching, the condition of the etching process can be watched with the naked eyes under illumination of natural light.

REFERENCES:
patent: 3775621 (1973-11-01), Gorin
patent: 3867216 (1975-02-01), Jacob
patent: 3923568 (1975-12-01), Bersin
patent: 4028155 (1977-06-01), Jacob

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