Gas distribution system for a post-etch treatment system

Details Gas distribution system for a post-etch treatment system Gas distribution system for a post-etch treatment system

2006-03-28

2011-10-11

Kackar, Ram (Department: 1716)

Coating apparatus

Gas or vapor deposition

C156S345330, C156S345340

Reexamination Certificate

active

08034176

ABSTRACT:
A post-etch treatment system is described for removing photoresist and etch residue formed during an etching process. For example, the etch residue can include halogen containing material. The post-etch treatment system comprises a vacuum chamber, a remote radical generation system coupled to the vacuum chamber, a radical gas distribution system coupled to the radical generation system and configured to distribute reactive radicals above a substrate, and a high temperature pedestal coupled to the vacuum chamber and configured to support the substrate. The gas distribution system is configured to efficiently transport radicals to the substrate and distribute the radicals above the substrate.

REFERENCES:
patent: 3996025 (1976-12-01), Gulden
patent: 5191218 (1993-03-01), Mori et al.
patent: 5529657 (1996-06-01), Ishii
patent: 5571366 (1996-11-01), Ishii et al.
patent: 5574247 (1996-11-01), Nishitani et al.
patent: 5884009 (1999-03-01), Okase
patent: 6179920 (2001-01-01), Tarutani et al.
patent: 6306216 (2001-10-01), Kim et al.
patent: 6444039 (2002-09-01), Nguyen
patent: 2002/0144784 (2002-10-01), Curry et al.
patent: 2002/0185229 (2002-12-01), Brcka et al.
patent: 2003/0010446 (2003-01-01), Kajiyama et al.
patent: 2003/0051665 (2003-03-01), Zhao et al.
patent: 2004/0129218 (2004-07-01), Takahashi et al.
patent: 2005/0150601 (2005-07-01), Srivastava
patent: 2005/0229848 (2005-10-01), Shinriki et al.
patent: 2005/0270895 (2005-12-01), Strang
patent: 2007/0032072 (2007-02-01), Sidhwa
patent: 2007/0163713 (2007-07-01), Kasai et al.

Affiliated with

Also associated with

Rating

Gas distribution system for a post-etch treatment system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas distribution system for a post-etch treatment system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas distribution system for a post-etch treatment system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4288815