Gas dispersion disk for use in plasma enhanced chemical vapor de

Details Gas dispersion disk for use in plasma enhanced chemical vapor de Gas dispersion disk for use in plasma enhanced chemical vapor de

1987-12-15

1988-12-20

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

118 501, 118728, 118620, 156345, 156646, 20419212, 204298, 427 38, B44C 122, B05B 502, C23C 1400, C03C 1500

Patent

active

047923784

ABSTRACT:
A chemical vapor transport reactor gas dispersion disk (20) for counteracting vapor pressure gradients to provide a uniform deposition of material films on a semiconductor slice (37). The disk (20) has a number of apertures (22) arranged so as to increase in aperture area per unit of disk area when extending from the center of the disk (20) to its outer peripheral edge.

REFERENCES:
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4534816 (1985-08-01), Chen et al.
patent: 4590042 (1986-05-01), Drage

Affiliated with

Also associated with

Rating

Gas dispersion disk for use in plasma enhanced chemical vapor de does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas dispersion disk for use in plasma enhanced chemical vapor de, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas dispersion disk for use in plasma enhanced chemical vapor de will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1908310