Coating apparatus – Program – cyclic – or time control – Having prerecorded program medium
Reexamination Certificate
2006-05-30
2006-05-30
Kackar, Ram N (Department: 1763)
Coating apparatus
Program, cyclic, or time control
Having prerecorded program medium
C118S715000, C118S695000, C118S696000, C118S698000, C438S694000, C438S695000, C438S784000, C438S787000, C438S788000, C427S585000, C427S578000, C427S579000, C427S588000, C204S192230, C204S192100, C204S298010
Reexamination Certificate
active
07052552
ABSTRACT:
A method and apparatus are disclosed for depositing a dielectric film in a gap having an aspect ratio at least as large as 6:1. By cycling the gas chemistry of a high-density-plasma chemical-vapor-deposition system between deposition and etching conditions, the gap may be substantially 100% filled. Such filling is achieved by adjusting the flow rates of the precursor gases such that the deposition to sputtering ratio during the deposition phases is within certain predetermined limits.
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Kwan Michael
Liu Eric
Applied Materials
Kackar Ram N
Townsend & Townsend & Crew LLP
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