Stock material or miscellaneous articles – Composite – Of silicon containing
Reexamination Certificate
2007-12-11
2007-12-11
Zimmer, Marc S. (Department: 1712)
Stock material or miscellaneous articles
Composite
Of silicon containing
C428S421000, C428S447000, C428S702000, C428S001500, C428S001510, C428S001520, C427S255270, C427S255700
Reexamination Certificate
active
11078505
ABSTRACT:
It is an object of the present invention to provide a gas barrier film improved in gas barrier characteristics by decreasing the adsorbent of the surface of a gas barrier layer to water and the like. The present invention attains the above object by providing a gas barrier film comprising a substrate, a gas barrier layer which is a vacuum deposition film, formed on one surface or both surfaces of the above substrate, and a water-repellent layer which is a film having water repellency, formed on the above gas barrier layer.
REFERENCES:
patent: 4119533 (1978-10-01), Saitoh et al.
patent: 5387449 (1995-02-01), Kunz et al.
patent: 5800918 (1998-09-01), Chartier et al.
patent: 5925479 (1999-07-01), Wei et al.
patent: 5939205 (1999-08-01), Yokoyama et al.
patent: 6242102 (2001-06-01), Tomka
patent: 6582823 (2003-06-01), Sakhrani et al.
patent: 6660392 (2003-12-01), Yamaguchi et al.
patent: 6664137 (2003-12-01), Weaver
patent: 2002/0028336 (2002-03-01), Jaccoud
patent: 2003/0026965 (2003-02-01), Richard
patent: 2004/0209126 (2004-10-01), Ziegler et al.
patent: 2005/0079380 (2005-04-01), Iwanaga
patent: 1287982 (2003-03-01), None
patent: 6-23903 (1994-02-01), None
patent: 7-204581 (1995-08-01), None
patent: 8-176326 (1996-07-01), None
patent: 11-309815 (1999-11-01), None
patent: 2000-006301 (2000-01-01), None
patent: 2000-177045 (2000-06-01), None
patent: 2000318081 (2000-11-01), None
“Polymers at Interfaces”; Journal of Polymer Science, Part C, Polymer Symposia; John Wiley and Sons, 1971, p. 27.
Notice of Rejection of Japanese patent application No. 2002-135178 with English translation.
Dai Nippon Printing Co.,Ltd.
Seyfarth Shaw LLP
Zimmer Marc S.
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