Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2007-10-02
2007-10-02
Norton, Nadine (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C134S003000, C134S026000, C134S034000, C134S037000, C216S058000, C216S090000, C216S103000, C216S108000, C438S725000, C438S745000, C438S748000
Reexamination Certificate
active
11034903
ABSTRACT:
A method for moving resist stripper across the surface of a semiconductor substrate includes applying a wet chemical resist stripper, such as an organic or oxidizing wet chemical resist stripper, to at least a portion of a photomask positioned over the semiconductor substrate. A carrier fluid, such as a gas, is then directed toward the semiconductor substrate so as to move the resist stripper across the substrate. The carrier fluid may be directed toward the substrate as the resist stripper is being applied thereto or following application of the resist stripper. A system for effecting the method is also disclosed.
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Angadi Maki
Norton Nadine
TraskBritt PC
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