Measuring and testing – Gas analysis
Reexamination Certificate
2011-06-21
2011-06-21
Larkin, Daniel S (Department: 2856)
Measuring and testing
Gas analysis
C250S492100, C355S053000
Reexamination Certificate
active
07963144
ABSTRACT:
A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross -sectional area of the channel section.
REFERENCES:
patent: 5037516 (1991-08-01), Buck
patent: 5504328 (1996-04-01), Bonser
patent: 2002/0030801 (2002-03-01), Endo et al.
patent: 2004/0079136 (2004-04-01), Pillion
patent: 2004/0100623 (2004-05-01), Bisschops
patent: 2008/0128636 (2008-06-01), Koster et al.
patent: 1 223 468 (2002-07-01), None
Non-Final Rejection mailed Sep. 16, 2008 for U.S. Appl. No. 11/602,496, 15 pgs.
Final Rejection mailed Mar. 20, 2009 for U.S. Appl. No. 11/602,496, 8 pgs.
Notice of Allowance mailed Jul. 20, 2009 for U.S. Appl. No. 11/602,496, 4 pgs.
International Search Report for Appln. No. PCT/NL2007/050545 mailed May 26, 2008, 3 pgs.
Allain et al., “Studies of liquid-metal erosion and free surface flowing liquid lithium retention of helium at the University of Illinois,” Fusion Engineering and Design, 72: 1-3, Elsevier Science Publishers, Amsterdam, NL, Nov. 1, 2004, pp. 93-110.
Ganguly et al., “Absence of a Steady State in Hydrogen Diluted Silane plasmas due to Mass Dependent Gas Pumping Speeds and its Consequences,” Materials Research Society Symposium Proceedings, 715, 2002, pp. A1.4.1-A1.4.5.
Blessings et al., Recommended practice for process sampling for partial pressure analysis,J. Vac. Sci. Technol. A 25 91), Jan./Feb. 2007, pp. 167-186.
Koster Norbertus Benedictus
Paarhuis Bart Dinand
Versluis Richard
ASML Netherlands B.V.
Larkin Daniel S
Sterne Kessler Goldstein & Fox P.L.L.C.
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