Method of designing a semiconductor integrated circuit...

Details Method of designing a semiconductor integrated circuit... Method of designing a semiconductor integrated circuit...

2011-06-07

2011-06-07

Lin, Sun J (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Integrated circuit design processing

Physical design processing

C716S100000, C716S110000, C716S118000, C716S122000

Reexamination Certificate

active

07958481

ABSTRACT:
An exemplary semiconductor integrated circuit is formed on a surface of a semiconductor chip includes a circuit region and a dummy region on the surface of the semiconductor chip. The circuit region includes a plurality of circuit patterns, which form circuit elements of the semiconductor integrated circuit, in a plurality of pattern layers. The dummy region includes a plurality of character dummies, which do not contribute to an operation of the semiconductor integrated circuit. The character dummies have a fixed shape and dimension, and arranged in a character pattern layer selected from the plurality of pattern layers with a fixed pitch. The dummy region further includes an identification sign formed by connecting selected ones of the character dummies chosen from the plurality of the character dummies.

REFERENCES:
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patent: 7679202 (2010-03-01), Yoshida et al.
patent: 2001/0048145 (2001-12-01), Takeuchi et al.
patent: 2005/0009298 (2005-01-01), Suzuki et al.
patent: 2007/0296091 (2007-12-01), Yoshida et al.
patent: A-2002-009161 (2002-01-01), None
patent: A-2004-311587 (2004-11-01), None
patent: A-2008-004724 (2008-01-01), None

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