Gas analyzing method and gas analyzer for semiconductor treater

Optics: measuring and testing – For light transmission or absorption – Of fluent material

Reexamination Certificate

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Reexamination Certificate

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06864982

ABSTRACT:
A gas analyzer for a semiconductor treater improved to be capable of monitoring leakage or change of gas composition influencing treatability of the semiconductor treater in situ is provided. A duct is provided on the outer wall of a chamber of the semiconductor treater for taking out gas to be analyzed from the chamber. A gas analytic chamber stores the gas to be analyzed taken out through the duct. A discharge formation part is mounted in the vicinity of the gas analytic chamber. The discharge formation part includes a high frequency generation coil generating a high frequency and forming a plasma of the gas to be analyzed in the gas analytic chamber. This gas analyzer further comprises a spectrometer analyzing the emission wavelength of the plasma of the gas to be analyzed.

REFERENCES:
patent: 6146492 (2000-11-01), Cho et al.
patent: 6493086 (2002-12-01), McAndrew et al.
patent: 6499492 (2002-12-01), Cho et al.
patent: 61-97928 (1986-05-01), None
patent: 2-82131 (1990-03-01), None

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